一、个人简介

赵荣波，男，1988年生，山东滨州人，中共党员，博士（后）。2021年毕业于中国科学院微电子研究所，获微电子学与固体电子学博士学位。2021-2024年于清华大学从事博士后研究工作。2024年10月于山东石油化工学院任教。主讲数字电子技术、专业英语、机器学习与人工智能概论等课程。

二、主要研究方向

集成电路制造、计算光刻、光刻工艺研发、光刻材料设计

三、代表性成果

1. Convolutional neural network-assisted photoresist formulation discriminator design of a contact layer for electron beam lithography. The Journal of Physical Chemistry Letters, 2024. 1/5 (SCI).

2. Machine learning applied to electron beam lithography to accelerate process optimization of a contact hole layer. ACS Applied Materials & Interfaces, 2024. 1/5 (SCI).

3. Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning. Nanoscale, 2024. 1/5 (SCI).

4. Critical dimension prediction of metal oxide nanoparticle photoresists for electron beam lithography using a recurrent neural network. Nanoscale, 2023. 1/5 (SCI).  

5. Process optimization of line patterns in extreme ultraviolet lithography using machine learning and a simulated annealing algorithm, Applied Optics, 2023. 1/9 (SCI).

6. Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithography, Applied Optics, 2023. 1/4 (SCI).

7. Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithm, Applied Optics, 2021. 1/4 (SCI).

8. Analysis and modulation of aberration in an extreme ultraviolet lithography projector via rigorous simulation and a back propagation neural network, Applied Optics, 2020. 1/5 (SCI).

9. Inverse kinematic solution of 6R robot manipulators based on screw theory and the Paden–Kahan subproblem, International Journal of Advanced Robotic Systems, 2018. 1/6 (SCI).

10. Impact of mask topography and flare on process window of EUV lithography, Proc. SPIE, 2019. 1/4 (EI).

11. Inverse kinematic solution algorithm of 6R robots based on screw theory and algebraic elimination. Transducer and Microsystem Technologies, 2018. 1/6.

12. Canny algorithm enabling precise offline line edge roughness acquisition in high-resolution lithography, ACS Omega, 2023. 2/8 (SCI).  

13. Trends in photoresist materials for extreme ultraviolet lithography: A review. Materials Today, 2023. 4/12 (SCI)

14. Impact of flare on source mask optimization in EUVL for 7nm technology node, Proc. SPIE, 2020. 4/11 (EI).

15. 光刻参数优化方法、装置及其相关设备, 2023. 发明专利.

16. 串联机器人的关节旋转角度确定方法及装置, 2022. 发明专利.

17. 6自由度串联机器人的关节旋转角度确定方法及装置, 2020. 发明专利.

四、联系方式

邮箱：zhaorongbo@sdipct.edu.cn